The Apollo
-
Higher throughput (50-70 wph)
Lower capital cost per wafer
-
Lower target costs/wafer (up to 50%)
Lower cost targets with longer lifetime
-
Enhanced vacuum performance
40% reduction in pump-down time
-
Still the smallest footprint
50% of cluster tool
Learn More
The Nimbus
-
Flexible, high performance PVD tool
½ the footprint and ½ the cost of cluster tools
-
Thin wafer (100 µm) to thick substrates (2.0 mm)
-
Quick wafer size change (90 minutes)
-
Low cost sputtering of magnetic materials (nickel)
Learn More
