NEXX Systems logo
About Us Products Applications News & Events Service Contact Us


Nimbus : Flip Chip Advanced Packaging : Stratus
Electro-deposition : Cirrus : ECR : Publications Library

 
Nimbus 364 Nimbus Systems



Nimbus 300

Nimbus Brochure (PDF) : Nimbus FAQs

Nimbus Video (7/03) [15.5 MB]
Note: video requires QuickTime 5 to play. QuickTime is available as a free download at: www.apple.com/quicktime/download/

The Nimbus is the only high throughput sputtering system designed specifically for advanced packaging. The Nimbus' innovative architecture enables simultaneous processing of batches of wafers to deposit the multiple layers required for under bump metallization (UBM), backside metallization, redistribution, and integrated passives.

The Nimbus combines many of the features and capabilities of the most advanced metal deposition cluster tools with the low cost and simplicity of in-line systems. High throughput, small footprint, and remarkable flexibility make the Nimbus the sputter tool of choice for advanced packaging applications.

The Nimbus is available either for automated or manual wafer loading. It uses a common platform for wafer sizes from 50 to 300 mm: the front-end configuration changes, dependent on wafer size. The system's unique wafer handling system enables it to process multiple wafer sizes with minimal hardware changes.

  • Automated Nimbus — consists of an atmospheric front-end, vacuum loadlock chamber, etch (pre-clean) chamber, and a multi-target batch deposition chamber; suitable for 200 and 300 mm wafers.

  • Semi-automated Nimbus — wafers are loaded manually in the loadlock, and tray transport is identical to that in the fully automated Nimbus; suitable for substrate sizes up to 300 x 600 mm.

Nimbus Video (7/03) [15.5 MB]
Note: video requires QuickTime 5 to play. QuickTime is available as a free download at: www.apple.com/quicktime/download/

"Pulsed DC Sputtered Aluminum Nitride: A Novel Approach to Control Stress and C-axis Orientation," by P. Soussan, K. O'Donnell, J. D'Haen, G. Vanhoyland, E. Beyne, and H. Tilmans, presented at MRS meeting, Boston, 2004 [688k].

“A Sputtered Nickel Under Bump Metallurgy Structure for Lead-free Solder for Use in Flip Chip Packaging,” by K. O’Donnell, J. Kostetsky, R. DeVito, NEXX Systems; and V. Bellido-Gonzalez, S. Powell, D. Monaghan, Gencoa; presented at the Flip Chip Conference 2003 with supplemental presentation materials [1.9 MB]

“Stress control in NiV, Cr and TiW Thin Films used in UBM and Backside Metallization,” by K. O’Donnell, J. Kostetsky, and R.S. Post, presented at the Flip Chip conference 2002 [3.9 MB]

Back to top

About Us : Products : Applications : News & Events : Service & Support : Contact Us : Home